Copper material for high-purity copper sputtering target, and high-purity copper sputtering target

Publish Time: Author: Site Editor Visit: 337

Abstract

This copper material for a high-purity copper sputtering target is such that the purity of Cu excluding O, H, N, and C is in a range of 99.999980 to 99.999998 mass%, the Al content is 0.005 mass ppm or less, and the Si content is 0.05 mass ppm or less.

Leave A Message

Warmly welcome your arrival. We will povide best products and best after-sales service for you.If you have any questions, please contact us